Semiconductor Industry
Description
Applications in the Semiconductor Industry range from seals and components for process equipment used in the fabrication of integrated circuits or semiconductors.
Solutions
SEMI (Semiconductor Equipment and Materials International) is a pseudoregulatory organisation offering some standards and testing procedures.
| Segments | Environment | Elastomers | Sealing Considerations |
|---|---|---|---|
| Crystal Growth (Pulling) | 25 to 200 C .001 - .01 torr | FKM | High thermal stability, chemical resistance, good vacuum performance |
| Thermal (LPCVD) Nitride, Oxide, ... | 23 to 300 C .5 - 1.0 torr | FKM, VMQ, FFKM | High thermal stability, chemical resistance, good vacuum performance |
| Track & Lithography | 25 to 100 C ambient | FKM, EPDM FFKM (AU) | Chemical resistance - solvents |
| Dry Etch | 25 to 200 C .1 - 1.0 torr | FKM, FFKM | Chemical resistance, plasma resistance, thermal stability, non-black preferred |
| Wet Etch | 25 to 200 C ambient | FKM, TFE, FFKM | Chemical resistance, no elemental contamination |
| Resist Stripping | 25 to 250 C .001 - .01 torr | FVMQ, VMQ, FKM, FFKM | Chemical resistance - especially oxygen- rich and ozone environment |
| Cleaning | 25 to 200 C ambient | FKM, FFKM | Acid and solvent resistance, some high pH chemical resistance |
| Chemical Vapor Deposition (CVD) | 25 to 250 C .001 - .01 torr | FKM, FFKM | High vacuum performance, chemical resistance, thermal stability |
| Ion Implant | 25 to 200 C .0000001 torr | NBR, FKM | Ultrahigh vacuum performance, low outgassing and permeation |
| Physical Vapor Deposition (PVD) | 25 to 200 C .000001 - .02 torr | FKM | Ultrahigh vacuum performance, low outgassing and permeation |
| Chemical Mechanical | 25 to 80 C ambient | EPDM, FFKM | Abrasion resistance, high pH chemical resistance |
